Effect of High-K Dielectric Materials on Leakage Current
نویسندگان
چکیده
Abstract: In this paper, a comparative study of different high-k dielectric materials based on tunneling current density has been deployed. The various types of high-k dielectric materials such as aluminium oxide, hafnium oxide, silicon nitride are compared using Schrödinger equation. The analytical model of tunneling current density has been computed using WKB approximation method. The simulation results of various high-k dielectric materials have also been computed. Different high-k dielectric materials are also compared on the basis of barrier height and effective mass etc.
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